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Volume 115, Issue 2, Pages 156-162 (December 2009)


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Two-dimensional assessment of cytoarchitecture in the superior temporal white matter in schizophrenia, major depressive disorder and bipolar disorder

Clare L. BeasleyabCorresponding Author Informationemail address, Mrinalini Honavarac, Ian P. Everallab, David Cotterab

Received 26 June 2009; received in revised form 17 September 2009; accepted 22 September 2009. published online 16 October 2009.

Abstract 

Evidence from brain imaging studies indicates that white matter volume, density and fractional anisotropy may be altered in individuals with schizophrenia and bipolar disorder. However, the molecular correlates of these deficits remain unknown. In this study we performed a cytoarchitectural assessment of the white matter adjacent to the planum temporale (PT), an auditory association region located within the superior temporal gyrus, in subjects with schizophrenia, bipolar disorder, major depressive disorder and controls (15 subjects per group). Using two-dimensional measures, we recorded the cell density, distribution and size of all neurons and glial nuclei within this region. Glial density was lower in the schizophrenia group, relative to the control group. Neuronal density, neuronal size, and glial nuclear size did not differ between groups. No significant differences in neuronal clustering were observed in the patient groups. Further studies are required to examine whether the observed decrease in glial density within the superior temporal white matter in schizophrenia reflects a deficit in any individual glial cell population.

a Department of Neuropathology, Institute of Psychiatry, DeCrespigny Park, London SE5 8AF, UK

b Department of Psychological Medicine, Institute of Psychiatry, DeCrespigny Park, London SE5 8AF, UK

c Hospital Pedro Hispano, Matosinhos, Portugal

Corresponding Author InformationCorresponding author. Present address: BC Mental Health and Addictions Research Institute, 938 West 28th Avenue, Vancouver, B.C., Canada V5Z 4H4. Tel.: +1 604 875 2000x4723; fax: +1 604 875 3871.

PII: S0920-9964(09)00472-1

doi:10.1016/j.schres.2009.09.028


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